|
|
Wet Bench
Single Wafer Cleaner
| Model： | DF-3000B |
| Type： | Cassette Less/Type |
| Wafer Size： | 300mm |
| Configuration： | 8~12 Baths,2~6 Robots （According to the demand） |
| Megasonic /Ultrasonic | |
| Bath over-temperature protection, equipped with leak sensor | |
| Multi-level wafer protection | |
| CCSS or LCSS Supply | |
| Automatic supply and support multiple concentration ratio | |
| Advanced marangoni dry technology | |
| Temperature control,concentration control, flow control, pressure control | |
| Chemical/DIW recycle & drain | |
| Reliability： | Uptime≥98% Breakage≤1/100000 |
| MTBF≥650 hours MTTR≤3 hours | |
| Software： | PC+PLC+GUI 控制, 支持Schedule、EAP、FDC等功能 |
Model： | FY-3000S |
Wafer Size： | 300mm |
Chamber： | 4~24 chambers（According to the demand） |
| Vacuum or Grip | |
| 4~5 Dispensers，2~3 chemicals | |
| Exhaust separation: Acid, Alkali, Organic drain separation etch chemical | |
| EFEM： | 2 or 4 SMIF/FOUP, 1 Index robot, 1or 2WTR |
| Chemical Supply： | CCSS or LCSS Supply |
| Circulation pump | |
| Heating control, Concentration control, Flow control, Pressure control | |
| Chemical / DIW, Drain & Recycle | |
| Configuration： | Ionizer / O3 / HD camera |
| Reliability： | Uptime≥98% Breakage≤1/100000 |
| MTBF≥500 hours MTTR≤3 hours | |
| Software： | PC+PLC+GUI, support EAP, FDC etc |
